Lierac Sebologie, maska złuszczająca, głęboko oczyszczająca

kosmetyk
1

Skład

Aqua, Kaolin, Oryza Sativa (Rice) Starch, Polylactic Acid, Zinc Gluconate, Stearic Acid, Caprylic/Capric Triglyceride, Palmitic Acid, Illite Cetyl Alcohol, Glyceryl Stearate, CI 77891/Titanium Dioxide, Glycerin, Microcrystalline Cellulose, Xanthan Gum, CI 77019/Mica, PEG-75 Stearate, Phenoxyethanol, Allantoin, Parfum, Salicylic Acid, Tromethamine, Ceteth-20, Stealth-20, Tetrasodium EDTA, Cellulose Gum, Montmorillonite, Propylene Glycol, Tocopherol, Glycine Soja Oil, Tin Oxide, CI 61570/Green 5, 1408A.